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The use of the laryngeal mask in gynaecological laparoscopyVIIRA, D; MYLES, P. S.Anaesthesia and intensive care. 2004, Vol 32, Num 4, pp 560-563, issn 0310-057X, 4 p.Article

METROLOGY IN MASK MANUFACTURINGROTTMANN HR.1982; IBM JOURNAL OF RESEARCH AND DEVELOPMENT; ISSN 0018-8646; USA; DA. 1982; VOL. 26; NO 5; PP. 553-560; BIBL. 7 REF.Article

A SIMPLE MASK ALIGNER AND PRINTING FRAME FOR CONFORMABLE PHOTOMASK LITHOGRAPHYSMILOWITZ B; LANG RJ.1980; IEEE TRANS. ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 11; PP. 2165-2167; BIBL. 3 REF.Article

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THEORY AND PRACTICE OF IMAGE FORMATION BY THE PHOTOPROJECTION METHOD OF SUBMICRON PATTERNS.VAN DEN BERG HAM; RUIGROK JJM.1978; APPL. PHYS.; GERM.; DA. 1978; VOL. 16; NO 3; PP. 279-287; BIBL. 19 REF.Article

AN ECONOMIC PHOTOMASK PROCESSING SCHEME FOR THE SMALL LABORATORY.JAGGERS KA.1978; INTERNATION. J. ELECTR. ENGNG EDUC.; G.B.; DA. 1978; VOL. 15; NO 1; PP. 41-52; ABS. FR. ALLEM. ESP.; BIBL. 4 REF.Article

PROXIMITY PRINKING OF CHROME MASKSMEYERHOFER D; MITCHELL J.1982; RCA REVIEW; ISSN 0033-6831; USA; DA. 1982; VOL. 43; NO 4; PP. 608-625; BIBL. 6 REF.Article

THE IMPACT OF PHOTORESIST ON IMAGE SIZEROTTMAN HR.1982; J. APPL. PHOTOGR. ENG.; ISSN 0098-7298; USA; DA. 1982; VOL. 8; NO 2; PP. 101-104; BIBL. 1 REF.Article

THE SILICON REPEATERBOUWER AG; BOUWHUIS G; VAN HEEK HF et al.1977; PHILIPS TECH. REV.; NLD; DA. 1977; VOL. 37; NO 11-12; PP. 330-333; BIBL. DISSEM.Article

KOSTENOPTIMIERUNG BEIM VERSCHLEISSMATERIAL AM BEISPIEL DER SCHABLONENNUTZUNG IN DER FOTOLITHOGRAFIE = L'OPTIMALISATION DES FRAIS DU MATERIEL D'USURE PRESENTEE A L'EXEMPLE DE L'UTILISATION DE MASQUES DANS LA PHOTOLITHOGRAPHIEBALARIN M.1982; NACHRICHTENTECHNIK. ELEKTRONIK; ISSN 0323-4657; DDR; DA. 1982; VOL. 32; NO 12; PP. 490-494; BIBL. 2 REF.Article

UNTERSUCHUNG DER DECKUNGSGENAUIGKEIT ZWEIER AUFEINANDERFOLGENDER FOTOSCHABLONENAUF TESTSCH EIBEN = ETUDE DE LA PRECISION DE RECOUVREMENT DE DEUX MASQUES PHOTOGRAPHIQUES SUCCESSIFS SUR UNE LAME D'ESSAIPAUER M; HUSZKA Z; PUSKAS L et al.1979; NACHR.-TECH., ELEKTRON.; DDR; DA. 1979; VOL. 29; NO 5; PP. 214-217Article

AUTOMATED PHOTOMASK INSPECTION.NOVOTNY DB; CIARLO DR.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 51-76 (10P.); BIBL. 32 REF.Article

PATTERN GENERATOR FOR HYBRID-ICSMIYAZAKI K; NAKAMURA K; AKASA R et al.1982; NEC RES. DEV.; ISSN 0048-0436; JPN; DA. 1982; NO 66; PP. 1-6; BIBL. 1 REF.Article

INFLUENCE OF AXIAL CHROMATIC ABERRATION IN PROJECTION POINTINGJAIN PK; NEUREUTHER AR; OLDHAM WG et al.1981; IEEE TRANSACTIONS ON ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1981; VOL. 28; NO 11; PP. 1410-1416; BIBL. 18 REF.Article

COMPUTER-AIDED CCD/LSI PHOTOMASK LAYOUT AND DOCUMENTATION TECHNIQUE USING NESTED CELLSGEER RG.1980; SOLID STATE TECHNOL.; USA; DA. 1980; VOL. 23; NO 5; PP. 86-90; BIBL. 2 REF.Article

ONE-STEP REPAIR OF TRANSPARENT DEFECTS IN HARD-SURFACE PHOTOLITHOGRAPHIC MASKS VIA LASER PHOTODEPOSITIONEHRLICH DJ; OSGOOD RM JR; SILVERSMITH DJ et al.1980; IEEE ELECTRON DEVICE LETT.; USA; DA. 1980; VOL. 1; NO 6; PP. 101-103; BIBL. 5 REF.Article

A PRODUCTION-COMPATIBLE MICROELECTRONIC TEST PATTERN FOR EVALUATING PHOTOMASK MISALIGNMENTRUSSELL TJ; MAXWELL DA.1979; NATION. BUR. STAND., SPEC. PUBL.; USA; DA. 1979; NO 400-51; 31 P.; BIBL. DISSEM.Serial Issue

AUTOMATED EQUIPMENT FOR 100% INSPECTION OF PHOTOMASKS.LEVY K.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 60-71 (8P.); BIBL. 5 REF.Article

AUTOMATIC ALIGNMENT CONSIDERATIONS IN WAFER FABRICATION.DENNING PA.1976; SOLID STATE TECHNOL.; U.S.A.; DA. 1976; VOL. 19; NO 5; PP. 43-47; BIBL. 3 REF.Article

1-Mbit MASK ROM and its applicationsSHIBATA, R; SHIMADA, S; KAWAMOTO, H et al.Hitachi review. 1984, Vol 33, Num 5, pp 241-246, issn 0018-277XArticle

NEW SINGLE-MASK APPROACH TO BUBBLE DEVICE FABRICATIONNISHIDA H; UMEZAKI H; KOYAMA N et al.1983; IEEE TRANSACTIONS ON MAGNETICS; ISSN 0018-9464; USA; DA. 1983; VOL. 19; NO 1; PP. 2-6; BIBL. 11 REF.Article

THE LARYNGEAL MASK: A NEW CONCEPT IN AIRWAY MANAGEMENTBRAIN AIJ.1983; BRITISH JOURNAL OF ANAESTHESIA; ISSN 0007-0912; GBR; DA. 1983; VOL. 55; NO 8; PP. 801-805; ABS. FRE/GER/SPA; BIBL. 3 REF.Article

EFFECT OF BREATHING PATTERN ON OXYGEN CONCENTRATION RECEIVED FROM STANDARD FACE MASKSGOLDSTEIN RS; YOUNG J; REBUCK AS et al.1982; LANCET (BR. ED.); ISSN 0140-6736; GBR; DA. 1982; NO 8309; PP. 1188-1190; BIBL. 11 REF.Article